Please use this identifier to cite or link to this item: https://hdl.handle.net/11147/2331
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dc.contributor.authorVahaplar, Kadir-
dc.contributor.authorTarı, Süleyman-
dc.contributor.authorTokuç, Hüseyin-
dc.contributor.authorOkur, Salih-
dc.date.accessioned2016-10-26T10:44:45Z
dc.date.available2016-10-26T10:44:45Z
dc.date.issued2009
dc.identifier.citationVahaplar, K., Tarı, S., Tokuç, H., and Okur, S. (2009). Effect of Ta buffer layer and thickness on the structural and magnetic properties of Co thin films. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 27(5), 2112-2116. doi:10.1116/1.3196784en_US
dc.identifier.issn1071-1023
dc.identifier.issn1071-1023-
dc.identifier.urihttp://dx.doi.org/10.1116/1.3196784
dc.identifier.urihttp://hdl.handle.net/11147/2331
dc.description.abstractSingle Co and Ta/Co bilayers were grown on Si(100) substrates in a magnetron sputtering system. The effect of Ta buffer layer and the thickness of Co layer on the structural and magnetic properties of the Co layers has been studied. A single Co layer shows a textured structure above thickness of 40 nm according to the x-ray diffraction (XRD) pattern. The magnetic properties of Co layers depend significantly on the thickness of the films. Ta grows as highly textured Β -Ta (tetragonal) phase on Si with a smooth surface. The XRD and atomic force microscopy results show that the Ta buffer layer improves the structural properties dramatically, resulting in a strongly textured and smoother surface morphology. The Ta layer also affects the magnetic properties of Co layers to a large extent, especially inducing an in-plane anisotropy in thin Co films.en_US
dc.description.sponsorshipTÜBİTAK TBAG-105T109en_US
dc.language.isoenen_US
dc.publisherAVS Science and Technology Societyen_US
dc.relation.ispartofJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomenaen_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectCobalten_US
dc.subjectMagnetron sputtering systemsen_US
dc.subjectSmooth surfaceen_US
dc.subjectThickness of the filmen_US
dc.titleEffect of Ta buffer layer and thickness on the structural and magnetic properties of Co thin filmsen_US
dc.typeArticleen_US
dc.institutionauthorVahaplar, Kadir-
dc.institutionauthorTarı, Süleyman-
dc.institutionauthorTokuç, Hüseyin-
dc.institutionauthorOkur, Salih-
dc.departmentİzmir Institute of Technology. Physicsen_US
dc.identifier.volume27en_US
dc.identifier.issue5en_US
dc.identifier.startpage2112en_US
dc.identifier.endpage2116en_US
dc.identifier.wosWOS:000270447400010en_US
dc.identifier.scopus2-s2.0-70349673587en_US
dc.relation.tubitakinfo:eu-repo/grantAgreement/TUBITAK/TBAG/105T109en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.identifier.doi10.1116/1.3196784-
dc.relation.doi10.1116/1.3196784en_US
dc.coverage.doi10.1116/1.3196784en_US
local.message.claim2022-06-07T11:49:21.090+0300|||rp02977|||submit_approve|||dc_contributor_author|||None*
dc.identifier.wosqualityQ2-
item.openairetypeArticle-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.fulltextWith Fulltext-
item.languageiso639-1en-
item.cerifentitytypePublications-
item.grantfulltextopen-
crisitem.author.dept04.05. Department of Pyhsics-
crisitem.author.dept04.05. Department of Pyhsics-
Appears in Collections:Physics / Fizik
Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection
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