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Bilayer Sns2: Tunable Stacking Sequence by Charging and Loading Pressure

dc.contributor.author Bacaksız, Cihan
dc.contributor.author Cahangirov, Seymur
dc.contributor.author Rubio, Angel
dc.contributor.author Senger, Ramazan Tugrul
dc.contributor.author Peeters, François M.
dc.contributor.author Şahin, Hasan
dc.contributor.other 04.04. Department of Photonics
dc.contributor.other 04.05. Department of Pyhsics
dc.contributor.other 04. Faculty of Science
dc.contributor.other 01. Izmir Institute of Technology
dc.coverage.doi 10.1103/PhysRevB.93.125403
dc.date.accessioned 2017-08-15T09:00:25Z
dc.date.available 2017-08-15T09:00:25Z
dc.date.issued 2016-03-03
dc.description.abstract Employing density functional theory-based methods, we investigate monolayer and bilayer structures of hexagonal SnS2, which is a recently synthesized monolayer metal dichalcogenide. Comparison of the 1H and 1T phases of monolayer SnS2 confirms the ground state to be the 1T phase. In its bilayer structure we examine different stacking configurations of the two layers. It is found that the interlayer coupling in bilayer SnS2 is weaker than that of typical transition-metal dichalcogenides so that alternative stacking orders have similar structural parameters and they are separated with low energy barriers. A possible signature of the stacking order in the SnS2 bilayer has been sought in the calculated absorbance and reflectivity spectra. We also study the effects of the external electric field, charging, and loading pressure on the characteristic properties of bilayer SnS2. It is found that (i) the electric field increases the coupling between the layers at its preferred stacking order, so the barrier height increases, (ii) the bang gap value can be tuned by the external E field and under sufficient E field, the bilayer SnS2 can become a semimetal, (iii) the most favorable stacking order can be switched by charging, and (iv) a loading pressure exceeding 3 GPa changes the stacking order. The E-field tunable band gap and easily tunable stacking sequence of SnS2 layers make this 2D crystal structure a good candidate for field effect transistor and nanoscale lubricant applications. en_US
dc.description.sponsorship TUBITAK Project (114F397-- 115F388); FWO Pegasus Marie Curie Fellowship; Marie Curie grant FP7-PEOPLE-IEF Project (628876); European Research Council (ERC-2010-AdG-267374); Spanish grant Grupos Consolidados (IT578-13) en_US
dc.identifier.citation Bacaksız, C., Cahangirov, S., Rubio, A., Senger, R.T., Peeters, F. M., and Şahin, H. (2016). Bilayer SnS2: Tunable stacking sequence by charging and loading pressure. Physical Review B, 93(12). doi:10.1103/PhysRevB.93.125403 en_US
dc.identifier.doi 10.1103/PhysRevB.93.125403 en_US
dc.identifier.issn 2469-9950
dc.identifier.issn 2469-9969
dc.identifier.issn 2469-9950
dc.identifier.scopus 2-s2.0-84960875199
dc.identifier.uri http://doi.org/10.1103/PhysRevB.93.125403
dc.identifier.uri http://hdl.handle.net/11147/6113
dc.language.iso en en_US
dc.publisher American Physical Society en_US
dc.relation info:eu-repo/grantAgreement/TUBITAK/MFAG/114F397 en_US
dc.relation.ispartof Physical Review B en_US
dc.rights info:eu-repo/semantics/openAccess en_US
dc.subject Bilayer structures en_US
dc.subject Stacking order en_US
dc.title Bilayer Sns2: Tunable Stacking Sequence by Charging and Loading Pressure en_US
dc.type Article en_US
dspace.entity.type Publication
gdc.author.id 0000-0003-0800-1924
gdc.author.id 0000-0002-6189-6707
gdc.author.id TR2199
gdc.author.id TR216960
gdc.author.institutional Bacaksız, Cihan
gdc.author.institutional Şahin, Hasan
gdc.author.institutional Senger, Ramazan Tuğrul
gdc.coar.access open access
gdc.coar.type text::journal::journal article
gdc.description.department İzmir Institute of Technology. Physics en_US
gdc.description.issue 12 en_US
gdc.description.publicationcategory Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı en_US
gdc.description.scopusquality Q2
gdc.description.volume 93 en_US
gdc.description.wosquality Q2
gdc.identifier.openalex W2410443081
gdc.identifier.wos WOS:000371405000005
gdc.openalex.fwci 2.709
gdc.openalex.normalizedpercentile 1.0
gdc.openalex.toppercent TOP 1%
gdc.opencitations.count 53
gdc.scopus.citedcount 56
gdc.wos.citedcount 56
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