Please use this identifier to cite or link to this item: https://hdl.handle.net/11147/5272
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dc.contributor.authorLiu, Shijie-
dc.contributor.authorRoeder, George-
dc.contributor.authorAygün, Gülnur-
dc.contributor.authorMotzek, Kristian-
dc.contributor.authorEvanschitzky, Peter-
dc.contributor.authorErdmann, Andreas-
dc.date.accessioned2017-04-10T09:05:23Z
dc.date.available2017-04-10T09:05:23Z
dc.date.issued2012-05
dc.identifier.citationLiu, S., Roeder, G., Aygün, G., Motzek, K., Evanschitzky, P. and Erdmann, A. (2012). Simulation of 3D inclined/rotated UV lithography and its application to microneedles. Optik, 123(10), 928-931. doi:10.1016/j.ijleo.2011.07.007en_US
dc.identifier.issn0030-4026
dc.identifier.issn0030-4026-
dc.identifier.issn1618-1336-
dc.identifier.urihttp://dx.doi.org/10.1016/j.ijleo.2011.07.007
dc.identifier.urihttp://hdl.handle.net/11147/5272
dc.description.abstractA 3D model is set up to simulate the exposure process of inclined/rotated UV lithography for negative SU-8 resists. The formation of inclined resist pillars and microstructures with truncated cone shapes is simulated based on a 3D exposure model in combination with a post exposure bake model for chemically amplified resists and the Mack development model. As one of the interesting applications employing this promising lithography technique for MEMS fabrication, a solid microneedle for drug delivery is simulated.en_US
dc.description.sponsorshipBayerische Forschungsstiftungen_US
dc.language.isoenen_US
dc.publisherUrban und Fischer Verlag GmbH und Co. KGen_US
dc.relation.ispartofOptiken_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subject3D simulationen_US
dc.subjectInclined and rotated exposureen_US
dc.subjectMicroneedlesen_US
dc.subjectUV lithographyen_US
dc.subjectThree dimensional computer graphicsen_US
dc.titleSimulation of 3D inclined/rotated UV lithography and its application to microneedlesen_US
dc.typeArticleen_US
dc.authoridTR39698en_US
dc.institutionauthorAygün, Gülnur-
dc.departmentİzmir Institute of Technology. Physicsen_US
dc.identifier.volume123en_US
dc.identifier.issue10en_US
dc.identifier.startpage928en_US
dc.identifier.endpage931en_US
dc.identifier.wosWOS:000304517800018en_US
dc.identifier.scopus2-s2.0-84859525747en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.identifier.doi10.1016/j.ijleo.2011.07.007-
dc.relation.doi10.1016/j.ijleo.2011.07.007en_US
dc.coverage.doi10.1016/j.ijleo.2011.07.007en_US
dc.identifier.wosqualityQ2-
dc.identifier.scopusqualityQ1-
item.fulltextWith Fulltext-
item.grantfulltextopen-
item.languageiso639-1en-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.cerifentitytypePublications-
item.openairetypeArticle-
crisitem.author.dept04.05. Department of Pyhsics-
Appears in Collections:Physics / Fizik
Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection
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