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https://hdl.handle.net/11147/4681
Title: | 1/F Noise in Hydrogenated Amorphous Silicon-Germanium Alloys | Authors: | Johanson, Robert E. Güneş, Mehmet Kasap, Safa O. |
Keywords: | Amorphous silicon Coplanar electrodes Hydrogenation Semiconducting germanium Silanes Spurious signal noise |
Publisher: | Institute of Electrical and Electronics Engineers | Source: | Johanson, R. E., Güneş, M., and Kasap, S. O. (2003). 1/f noise in hydrogenated amorphous silicon-germanium alloys. IEE Proceedings: Circuits, Devices and Systems, 150(4), 345-349. doi:10.1049/ip-cds:20030749 | Abstract: | Measurements were made of conductance noise of a-Si:H and a-Si 1-xGex:H in two different geometries: one where the current flow is transverse to the surface and the other where it is longitudinal to the surface. Because of the large change in sample resistance between the two geometries, it was not possible to measure both geometries at the same temperature. For both geometries, alloyinzg with up to 40% Ge reduces the noise magnitude by several orders of magnitude over that found in a-Si:H. The decrease is incompatible with several popular noise models. Extrapolating the temperature trends for each geometry shows that it is possible that the noise observed in the transverse samples has the same origin as the higher frequency part of the double power law spectra observed in the longitudinal samples. | URI: | http://doi.org/10.1049/ip-cds:20030749 http://hdl.handle.net/11147/4681 |
ISSN: | 1350-2409 |
Appears in Collections: | Physics / Fizik Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection |
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