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https://hdl.handle.net/11147/4673
Title: | Conductance fluctuations in a-Si:H: Effects of alloying and device structure | Authors: | Kasap, Safa O. Güneş, Mehmet Johanson, Robert E. Wang, Q. Yang, Jeffrey Guha, Subhendu |
Keywords: | Silanes Conductance noises Alloying Electrodes Plasma enhanced chemical vapor deposition |
Publisher: | Springer Verlag | Source: | Kasap, S. O., Güneş, M., Johanson, R. E., Wang, Q., Yang, J., and Guha, S. (2003). Conductance fluctuations in a-Si:H: Effects of alloying and device structure. Journal of Materials Science: Materials in Electronics, 14(10-12), 693-696. doi:10.1023/A:1026127020267 | Abstract: | We present measurements of conductance noise in undoped a-Si:H and a-SiGe: H thin films in both a transverse and coplanar electrode geometry. For a-Si:H with coplanar electrodes, the noise spectrum is not a pure f-α power law but consists of two linear regions with different slope parameters α. The spectral shape and its temperature dependence are similar for all samples, regardless of the growth technique. Adding Ge results in qualitatively similar spectra; however, α at high frequencies and the temperature dependence are altered. For both a-Si:H and a-SiGe:H with transverse electrodes, the noise spectra are pure f-α power laws, and α decreases with the Ge content. | URI: | http://doi.org/10.1023/A:1026127020267 http://hdl.handle.net/11147/4673 |
ISSN: | 0957-4522 0957-4522 |
Appears in Collections: | Physics / Fizik Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection |
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